JPS6185868U - - Google Patents
Info
- Publication number
- JPS6185868U JPS6185868U JP17083384U JP17083384U JPS6185868U JP S6185868 U JPS6185868 U JP S6185868U JP 17083384 U JP17083384 U JP 17083384U JP 17083384 U JP17083384 U JP 17083384U JP S6185868 U JPS6185868 U JP S6185868U
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive drum
- transfer device
- copying machine
- belt
- drum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000002093 peripheral effect Effects 0.000 claims 1
Landscapes
- Separation, Sorting, Adjustment, Or Bending Of Sheets To Be Conveyed (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17083384U JPS6185868U (en]) | 1984-11-09 | 1984-11-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17083384U JPS6185868U (en]) | 1984-11-09 | 1984-11-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6185868U true JPS6185868U (en]) | 1986-06-05 |
Family
ID=30728544
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17083384U Pending JPS6185868U (en]) | 1984-11-09 | 1984-11-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6185868U (en]) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6979605B2 (en) | 2001-11-30 | 2005-12-27 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light |
| US7050878B2 (en) | 2001-11-22 | 2006-05-23 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductror fabricating apparatus |
| US7133737B2 (en) | 2001-11-30 | 2006-11-07 | Semiconductor Energy Laboratory Co., Ltd. | Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer |
| US7214573B2 (en) | 2001-12-11 | 2007-05-08 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a semiconductor device that includes patterning sub-islands |
-
1984
- 1984-11-09 JP JP17083384U patent/JPS6185868U/ja active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7050878B2 (en) | 2001-11-22 | 2006-05-23 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductror fabricating apparatus |
| US7439115B2 (en) | 2001-11-22 | 2008-10-21 | Semiconductor Eneregy Laboratory Co., Ltd. | Semiconductor fabricating apparatus |
| US6979605B2 (en) | 2001-11-30 | 2005-12-27 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light |
| US7133737B2 (en) | 2001-11-30 | 2006-11-07 | Semiconductor Energy Laboratory Co., Ltd. | Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer |
| US7510920B2 (en) | 2001-11-30 | 2009-03-31 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method for a thin film transistor that uses a pulse oscillation laser crystallize an amorphous semiconductor film |
| US7588974B2 (en) | 2001-11-30 | 2009-09-15 | Semiconductor Energy Laboratory Co., Ltd. | Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer |
| US7214573B2 (en) | 2001-12-11 | 2007-05-08 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a semiconductor device that includes patterning sub-islands |
| US7560397B2 (en) | 2001-12-11 | 2009-07-14 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation method and method of manufacturing a semiconductor device |